Novolak resins of lowered hydroxyl content and high contrast...

C - Chemistry – Metallurgy – 08 – G

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

96/158, 402/55

C08G 8/08 (2006.01) C08G 8/04 (2006.01) G03F 7/022 (2006.01) G03F 7/023 (2006.01) G03F 7/038 (2006.01)

Patent

CA 2034602

NOVOLAK RESINS OF LOWERED HYDROXYL CONTENT AND HIGH CONTRAST HIGH THERMAL STABILITY POSITIVE PHOTORESISTS PREPARED THEREFROM ABSTRACT OF THE DISCLOSURE Novolak resins are provided which are the condensation product of (a) a phenol, phenol derivative, or mixtures thereof and (b) a mixture of formaldehyde or a formaldehyde precursor and (1) a monohydroxy aromatic aldehyde and wherein at least a portion of the hydroxyl groups thereof are esterified or (2) a mixture of at least one monohydroxy aromatic aldehyde and at least one non-hydroxylic aromatic aldehyde; the novolak resins having a hydroxyl number of from about 120 to about 180 grams c resin per equivalent of hydroxyl. The novolak resins are especially useful in positive photoresist formulations and have enhanced photospeed and film loss characteristics as well as improved thermal stability.

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Novolak resins of lowered hydroxyl content and high contrast... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Novolak resins of lowered hydroxyl content and high contrast..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Novolak resins of lowered hydroxyl content and high contrast... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1721246

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.