Novolak resins of lowered hydroxyl content and high contrast...

Details Novolak resins of lowered hydroxyl content and high contrast... Novolak resins of lowered hydroxyl content and high contrast...

C - Chemistry, Metallurgy

08

G

96/158, 402/55

C08G 8/08 (2006.01) C08G 8/04 (2006.01) G03F 7/022 (2006.01) G03F 7/023 (2006.01) G03F 7/038 (2006.01)

Patent

CA 2034602

NOVOLAK RESINS OF LOWERED HYDROXYL CONTENT AND HIGH CONTRAST HIGH THERMAL STABILITY POSITIVE PHOTORESISTS PREPARED THEREFROM ABSTRACT OF THE DISCLOSURE Novolak resins are provided which are the condensation product of (a) a phenol, phenol derivative, or mixtures thereof and (b) a mixture of formaldehyde or a formaldehyde precursor and (1) a monohydroxy aromatic aldehyde and wherein at least a portion of the hydroxyl groups thereof are esterified or (2) a mixture of at least one monohydroxy aromatic aldehyde and at least one non-hydroxylic aromatic aldehyde; the novolak resins having a hydroxyl number of from about 120 to about 180 grams c resin per equivalent of hydroxyl. The novolak resins are especially useful in positive photoresist formulations and have enhanced photospeed and film loss characteristics as well as improved thermal stability.

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