C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/558.1, 260/2
C07C 131/00 (1980.01)
Patent
CA 1054149
ABSTRACT OF THE DISCLOSURE The present invention relates to a compound having the formula: Image (I) in which R1 represents a phenyl radical or such a radical substituted by at least one substituent selected from lower alkyl or lower alkoxy radicals having 1-4 carbon atoms, halogen, the nitro, amino and cyano groups or a naphthyl radical, R2 represents a hydrogen atom, a C1-C4 alkyl radical or a phenyl radical or R1 and R2 together with the carbon atom to which they are attached, form a polycyclic substituent selected from 9-fluorenylidene, Xanthenylidene, Indan- 5-ylidene, 1,2,3,4-tetrahydronaphthalen-1-ylidene, 10,11-dihydro- 5H-dibenzo(a-d)cyclohepten-5-ylidene, and 5H-dibenzo(a-d)cyclohepten- 5-ylidene and R3 represents an isopropyl or tert. butyl radical, or a pharmaceutically acceptable acid addition salts thereof. Such a compound is useful as anti-hypertensive drug.
245715
Schwartz Jean
Wermuth Camille G.
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