C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/474.2, 260/3
C07D 295/092 (2006.01)
Patent
CA 1137098
A tract of the Disclosure Compounds of the formula Image (I) or pharmaceutically acceptable acid addition salts thereof (for exam- ple, a chloride) are useful as local anesthetics. In the compound of the formula (I ), R is hydrogen or C4-C14 alkyl, ALK is C1-C4 alkylene, R1 and R2 may be the same or different and are hydrogen or C1-C6 alkyl or R1 and R2 taken together form a 5 to 7 atom ring which contains 1 to 2 nitrogen atoms.
354524
Chang Ching-Te
Su Tsung-Tsan
Gowling Lafleur Henderson Llp
Industrial Technology & Research Institute
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