Oled devices with photoresist mask/smoothing layer

Details Oled devices with photoresist mask/smoothing layer Oled devices with photoresist mask/smoothing layer

H - Electricity

01

L

H01L 51/50 (2006.01) H01L 51/56 (2006.01)

Patent

CA 2397857

The invention relates to manufacture of OLEDs. In OLEDs, imperfect step coverage of the deposited organic materials will result in a substantially higher electric field at that area, causing breakdown. In some cases, patterned electrodes layer is thicker than the whole organic layer and uncovered electrode areas may get in contact with the metal cathode layer, resulting in short circuits. Also when the total thickness of one electrode and organic layers exceeds the thickness of another electrode, discontinuity may occur in one electrode layer. The invention relates to a technique which uses commercially available photoresist as a masking/insulating layer to define the emissive and non-emissive areas of the light emitting devices. This layer is thick enough to cover all the steps produced in patterning. Upon a baking process, the photoresist reflows, providing slopes of the edges of the steps. This photoresist layer therefore not only functions as a mask layer to define an active area but also blunt steep edges, ensuring electrical continuity.

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