Oligomeric amine and phenolic antidegradants

Details Oligomeric amine and phenolic antidegradants Oligomeric amine and phenolic antidegradants

C - Chemistry, Metallurgy

07

C

6/128, 400/5049,

C07C 323/16 (2006.01) C07C 323/58 (2006.01) C08K 5/37 (2006.01) C08K 5/372 (2006.01)

Patent

CA 1304409

Abstract of the Disclosure OLIGOMERIC AMINE AND PHENOLIC ANTIDEGRADANTS There is disclosed a compound having the structure A-S-X-S-A' I wherein A and A' are radicals independently selected from the group consisting of the following structures: Image II and Image Ill wherein R1 and R2 are tertiary alkyl radicals having 4 to 8, preferably 4 to 6 carbon atoms, n is a whole number of 1 to 8, R3 and R~ are the same or different radlcals selected from the group consisting of hydrogen and alkyl radicals having 1 to 18 carbon atoms, R5 is hydrogen or methyl and Z is -O- or -?-; H A' can also be hydrogen; and X is a divalent oligomeric segmer having the structure: -~C2H~OcH20c2H~SS ~ C2H4OCH20C2H4 IV wherein m ranges from an average of 4 to about 24.

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