Optical arrangement and its use

Details Optical arrangement and its use Optical arrangement and its use

G - Physics

02

B

G02B 27/09 (2006.01) B23K 26/00 (2006.01)

Patent

CA 2701597

The invention relates to an optical arrangement (10) having a laser (1), wherein an amplitude mask (3) is introduced in the beam path of the laser beam (2) coming from the laser (1), between the laser (1) and a focusing element (4), such that the laser beam (2) can be guided such that the laser beam (2) strikes the amplitude mask (3) before the laser beam is focused in the focusing element (4) and the laser beam (2'), which has been modified by the focusing element (4), is directed at a focal point (6) and, if appropriate, at least two sub-maxima (7, 7') in a photosensitive material (5). The arrangement (10) is thus suitable for producing chemical or physical changes, ablations, micro-explosions, plasmas or micro-tears in the photosensitive material (5). The arrangement (10) is preferably used for carrying out single- photon or multi-photon absorption in the focal point (6) or in one of the at least two sub-maxima (7, 7') of the modified laser beam (2') in the photosensitive material (5).

L'invention concerne un arrangement optique (10) comprenant un laser (1). Selon l'invention, un masque d'amplitude (3) est disposé dans le trajet du rayon laser (2) sortant du laser (1) entre le laser (1) et un élément de concentration (4) de telle sorte que le rayon laser (2) peut être guidé de manière à ce que l'exposition du masque d'amplitude (3) au rayon laser (2) ait lieu avant la concentration du rayon laser dans l'élément de concentration (4) et le rayon laser modifié (2') par l'élément de concentration (4) est dirigé sur un point focal (6) et éventuellement au moins deux maximums secondaires (7, 7') à l'intérieur d'un matériau photosensible (5). L'arrangement (10) convient ainsi pour produire des modifications chimiques ou physiques, des ablations, des microexplosions, des plasmas ou des microfissures dans le matériau photosensible (5). L'arrangement (10) est utilisé de préférence pour réaliser une absorption d'un ou de plusieurs photons dans le point focal (6) ou dans l'un des au moins deux maximums secondaires (7, 7') du rayon laser modifié (2') au sein du matériau photosensible (5).

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