Optical arrangement for exposure apparatus

Details Optical arrangement for exposure apparatus Optical arrangement for exposure apparatus

G - Physics

21

K

G21K 1/06 (2006.01) G03F 7/20 (2006.01) G21K 5/02 (2006.01) H01L 21/00 (2006.01)

Patent

CA 2080083

Disclosed is an optical arrangement which includes an optical system for transforming synchrotron radiation light emitted from an emission point of a synchrotron ring into a substantially parallel beam, with respect to a first direction which is parallel to an orbit plane of the synchrotron ring and with respect to a second direction which is perpendicular to the orbit plane, wherein an absolute value of a focal length of the optical system in the first direction is smaller than that in the second direction.

L'invention est un dispositif optique comportant un système optique qui sert à transformer le rayonnement synchrotron lumineux émis à un point de l'anneau d'un synchrotron sous la forme d'un faisceau essentiellement parallèle à une première direction parallèle à un plan orbital de l'anneau du synchrotron, et à une seconde direction perpendiculaire à ce plan orbital, la valeur absolue de la distance focale du système optique dans la première direction étant inférieure à la distance focale dans la seconde direction.

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