Optical element such as multilayer film reflector, and the...

G - Physics – 21 – K

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G21K 1/06 (2006.01)

Patent

CA 2361519

A multilayer film reflector capable of simply correcting a wavefront phase and a method of forming the reflector are disclosed. For this purpose, a reflector using reflection by a multilayer film is disclosed. This multilayer film is formed in a number of cycles larger than that necessary to substantially saturate a reflectance, and a wavefront phase of emerging rays is adjusted by cutting away the multilayer film in accordance with an amount of adjustment of the wavefront phase. Further, the formation of a correction film as well as the formation of a multilayer larger than necessary to substantially saturate the reflectance permits the correction of a phase by cutting away also the multilayer film when the phase cannot be corrected only by cutting away the correction film, whereby the phase can be corrected more accurately.

Cette invention se rapporte à un miroir de réflexion à film multicouche qui est capable de corriger de façon simple une phase de front d'ondes, et à un procédé de production de ce miroir. Un tel miroir de réflexion utilise la réflexion d'un film multicouche, qui est formé avec une fréquence supérieure à ce qui est nécessaire pour produire la saturation du facteur de réflexion et qui est arasé en fonction d'une quantité de régulation de la phase de front d'ondes de la lumière sortante, pour permettre la régulation de la phase du front d'onde. Dès lors que l'on forme un film de correction et un film multicouche ayant une capacité qui dépasse la saturation du facteur de réflexion, il est possible d'obtenir un effet de correction par arasage du film multicouche, même lorsqu'un retrait du film de correction n'est pas suffisant pour produire une correction de phase, permettant ainsi une correction de phase plus précise.

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