G - Physics – 03 – F
Patent
G - Physics
03
F
96/256
G03F 7/26 (2006.01) G11B 7/24 (2006.01) G11B 7/26 (2006.01) G11B 11/10 (2006.01)
Patent
CA 1298728
ABSTRACT OF THE DISCLOSURE A method is disclosed for manufacturing an optical memory element, comprising the steps of providing a substrate, disposing a resist film on the substrate, providing a photo-mask carrying a guide groove pattern on the resist film so as to position the photo-mask over a predetermined position of the substrate, forming a guide groove pattern latent image on the resist film, developing the guide groove pattern latent image formed on the resist film, conducting an etching operation through the developed guide groove pattern so as to form guide grooves in the substrate, removing the resist film from the substrate, and disposing a recording medium layer on the substrate having the guide grooves formed therein.
516113
Deguchi Toshihisa
Hirokane Junji
Inui Tetsuya
Katoh Shohichi
Ohta Kenji
G. Ronald Bell & Associates
Sharp Kabushiki Kaisha
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