Optical semiconductor device with multiple quantum well...

H - Electricity – 01 – S

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H01S 5/343 (2006.01) H01S 5/34 (2006.01) H01L 33/00 (2006.01)

Patent

CA 2360502

The invention relates to an optical semiconductor device comprising a multiple quantum well structure, in which well layers and barrier layers consisting of different types of semiconductor layers are stacked alternately on top of one another. The invention is characterised in that the well layers (6a) have a first composition, based on a nitride semiconductor material with a first electron energy and the barrier layers (6b) have a second composition based on a nitride semiconductor material with a higher electron energy in relation to the first electron energy. An active radiative quantum well layer (6c) is located downstream of said layers in the epitaxial direction and the essentially non-radiative well layers (6a) positioned upstream, together with the barrier layers (6b) form a superlattice for said active quantum well layer.

L'invention concerne un dispositif à semiconducteur optique doté d'une structure de puits quantique multicouche, selon lequel les couches puits et les couches barrières, constituées de différents types de couches à semiconducteur, sont superposées alternativement. Le dispositif est caractérisé en ce que les couches puits (6a) d'une première composition à base d'un matériau semiconducteur à base de nitrure doté d'une première énergie électronique et en ce que les couches barrières (6b) d'une deuxième composition sont à base d'un matériau semiconducteur à base de nitrure doté d'une énergie électronique supérieure à la première, une couche puits radiante (6c) étant placée en aval dans le sens épitaxial du dispositif et les couches puits (6a) essentiellement non radiantes placées en amont formant un superréseau avec les couches barrière (6b).

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