Optical waveguide grating and production method therefor

G - Physics – 02 – B

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G02B 5/18 (2006.01) C03B 37/10 (2006.01)

Patent

CA 2202308

A method of producing an optical waveguide grating by exposure to light. An optical waveguide having a core composed of a material wherein the refractive index changes due to exposure to UV light is formed into an optical waveguide grating by applying a grating portion formation step wherein a grating portion is formed by irradiation with UV light at a predetermined spacing, and an overall exposure step after formation of the grating portion wherein the entire grating portion is irradiated with UV light. As a result, the effective refractive index of the grating portion is changed so as to allow the central wavelength to be adjusted without changing the rejection. Consequently, the grating properties can be precisely and easily controlled.

Méthode de fabrication d'un réseau de diffraction de guide d'onde optique par exposition à la lumière. Un guide d'onde optique, dont l'âme est constituée d'une substance qui change d'indice de réfraction en présence de rayons UV, est transformé en réseau de diffraction de guide d'onde optique à la suite d'une étape de fabrication qui consiste à exposer le réseau de diffraction aux rayonnements UV dans un espacement déterminé. Cette étape est suivie d'une étape d'exposition totale, qui consiste à exposer tout le réseau de diffraction aux rayonnements UV. L'indice de réfraction effectif du réseau de diffraction est ainsi modifié afin de permettre l'ajustement de l'onde centrale sans modifier la réjection. Par conséquent, les caractéristiques du réseau de diffraction peuvent être modifiées facilement et avec précision.

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