Optoelectronic devices utilizing multiple quantum well pin...

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H01L 31/105 (2006.01) G02F 1/015 (2006.01) G02F 1/017 (2006.01) G02F 1/025 (2006.01) H01L 31/0352 (2006.01) H01L 31/18 (2006.01) H01S 5/042 (2006.01) H01S 5/183 (2006.01) H01S 5/30 (2006.01) H01S 5/34 (2006.01)

Patent

CA 2156333

Optoelectronic devices such as photodetectors, modulators and lasers with improved optical properties are provided with an atomically smooth transition between the buried conductive layer and quantum-well-diode-containing intrinsic region of a p-i-n structure. The buried conductive layer is grown on an underlying substrate utilizing a surfactant-assisted growth technique. The dopant and dopant concentration are selected, as a function of the thickness of the conductive layer to be formed, so that a surface impurity concentration of from 0.1 to 1 monolayer of dopant atoms is provided. The presence of the impurities promotes atomic ordering at the interface between the conductive layer and the intrinsic region, and subsequently results in sharp barriers between the alternating layers comprising the quantum-well-diodes of the intrinsic layer.

L'invention porte sur des dispositifs optoélectroniques, tels que des photodétecteurs, des modulateurs et des lasers, à caractéristiques optiques améliorées dans lesquels une transition graduelle est réalisée à l'échelle atomique entre la couche conductrice enfouie et les régions intrinsèques contenant des diodes à puits quantiques dans une structure p-i-n. La couche conductrice enfouie est obtenue par croissance sur un substrat à l'aide d'un agent de surface. Le dopant et la concentration en dopant sont sélectionnés en fonction de l'épaisseur de la couche conductrice à former de façon que la concentration des impuretés à la surface varie de 0,1 à 1 couche monoatomique d'atomes dopants. La présence des impuretés favorise la régularité des atomes à l'interface entre la couche conductrice et la région intrinsèque et il en résulte l'apparition de barrières nettes entre les couches alternées qui contiennent les diodes à puits quantiques de la couche intrinsèque.

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