G - Physics – 03 – F
Patent
G - Physics
03
F
96/69
G03F 7/32 (2006.01)
Patent
CA 1313470
20731-983 Abstract of the Disclosure An organic solvent free developer composition having a pH in the range of from about 5.5 to about 7.5 comprising in admixture: a) from about 0.1% to about 20% by weight of the developer of one or more compounds selected from the group consisting of sodium octyl sulfate, sodium tetradecyl sulfate, sodium 2-ethyl hexyl sulfate and ammonium lauryl sulfate; and b) from about 0.1% to about 30% by weight of the developer of one or more components selected from the group consisting of lithium salts of hydroxy, aryl and alkyl carboxylic acids; and c) from about 0.1% to about 30% by weight of the developer of one or more compounds selected from the group consisting of potassium salts of hydroxy, aryl and alkyl carboxylic acids; and d) an optional compatible organic or inorganic acid or base in an amount sufficient to adjust the pH of the developer composition into the range of from about 6.5 to about 7.5; and e) an optional anti-foam component in an amount of from about 0.02 to about 0.05% by weight of the developer; and f) sufficient water to formulate an effective developer.
559021
Hsieh Shane
Mitchell Wayne A.
Fetherstonhaugh & Co.
Hoechst Celanese Corporation
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