Organic stripping compositions and method for using same

Details Organic stripping compositions and method for using same Organic stripping compositions and method for using same

C - Chemistry, Metallurgy

11

D

149/21

C11D 7/34 (2006.01) C09D 9/00 (2006.01) G03F 7/42 (2006.01)

Patent

CA 1074218

INVENTION: IMPROVED ORGANIC STRIPPING COMPOSITIONS AND METHOD FOR USING SAME INVENTOR: JOHN E. VANDER MEY ABSTRACT OF THE DISCLOSURE Improved organic stripping compositions are described, useful in removing polymeric organic substances, such as photo- resists, from metallized inorganic substrates, which comprise one or more organic sulfonic acids, such as linear dodecylbenzene- sulfonic acid, para-toluenesulfonic acid and phenolsulfonic acid, one or more organic solvents and optionally, phenol, wherein the improvement comprises incorporating fluoride ion in the composi- tion in an amount of about 5 to 250 ppm by weight, preferably about 10 to 200 ppm by weight and more preferably about 15 to 100 ppm by weight. Methods for using the above compositions to remove the polymeric organic substances from metallized inorganic sub- strates are also described.

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