Organogermanium compounds and process for producing the same

C - Chemistry – Metallurgy – 07 – F

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C07F 7/30 (2006.01) A61K 31/28 (2006.01)

Patent

CA 1322761

72057-10 ABSTRACT OF THE DISCLOSURE Disclosed are organogermanium compound of the formulae Image and Image (1,2) (3,4-O,S) (wherein X is halogen, R is hydrogen, lower alkyl or phenyl, R1 is -NHCOCH3 or -NH2.HY, R2 is -NHCOCH3 or -NH2 and Z is O or S). The compounds (3,4-O,S), particularly when R2 is -NH2, has an ability to suppress the formation of Amadori rearrangement product and are useful as a therapeutic agent.

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