C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
96/256, 402/7.3
C08F 30/04 (2006.01) C07F 7/00 (2006.01) C07F 7/08 (2006.01) C08F 8/42 (2006.01) G03F 7/039 (2006.01) G03F 7/075 (2006.01)
Patent
CA 1317060
K-16673/+ Organometal-containing polymers and use thereof Abstract Organometal-containing polymers having side chains of the formula I Image (I), in which, for example, M is Si, X is O, R1 and R2 are hydrogen and R4 to R6 are each methyl and which have an average molecular weight bet- ween 1,000 and 1,000,000, are suitable for the preparation of dry-devel- opable photoresists, such as are required for the generation of struc- tured images, in particular in microelectronics.
576431
Ag Ciba-Geigy
Fetherstonhaugh & Co.
Steinmann Alfred
LandOfFree
Organometal-containing polymers and use thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Organometal-containing polymers and use thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Organometal-containing polymers and use thereof will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1220767