Organometal-containing polymers and use thereof

C - Chemistry – Metallurgy – 08 – F

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96/256, 402/7.3

C08F 30/04 (2006.01) C07F 7/00 (2006.01) C07F 7/08 (2006.01) C08F 8/42 (2006.01) G03F 7/039 (2006.01) G03F 7/075 (2006.01)

Patent

CA 1317060

K-16673/+ Organometal-containing polymers and use thereof Abstract Organometal-containing polymers having side chains of the formula I Image (I), in which, for example, M is Si, X is O, R1 and R2 are hydrogen and R4 to R6 are each methyl and which have an average molecular weight bet- ween 1,000 and 1,000,000, are suitable for the preparation of dry-devel- opable photoresists, such as are required for the generation of struc- tured images, in particular in microelectronics.

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