Organometallic polymers

C - Chemistry – Metallurgy – 08 – G

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96/252, 402/8, 4

C08G 2/14 (2006.01) C08G 2/20 (2006.01) G03F 7/039 (2006.01)

Patent

CA 1271878

Novel organometallic polymers Abstract of the Disclosure Homopolymers or copolymers of organometallic, end-capped polyphthal- aldehydes containing the repeating unit of formula I Image (I) wherein R1, R2, R3 and R4 are each independently of the other hydrogen, halogen, cyano, nitro, carboxyl, hydroxyl, C1-C4alkoxy, C1-C4alkylthio or C1-C4alkoxycarbonyl, and at least one of the substituents R1, R2, R3 and R4 are a group -Q(R5)3 or -Q(R6)3, where Q is Si, Sn, Ge, CH2-Si or O-Si, R5 is C1-C12alkyl and R6 is C6-C10aryl, are suitable for producing dry-developed, plasma-resist- ant photoresists required for the production of structured images, especially for microelectronics.

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