C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
260/440, 260/446
C07F 7/08 (2006.01)
Patent
CA 1080735
ORGANOSILANE COMPOUNDS David C. Heckert David M. Watt, Jr. ABSTRACT OF THE DISCLOSURE Novel compounds of formula Image or siloxane oligomers thereof, wherein R1 is an alkyl group containing 1 to 4 carbon atoms; a is 0 to 2; R2 is an alkyl group containing 1 to 18 carbon atoms; b is 1 to 3; at least one R3 is a carboxy-substituted alkyl group containing 1 to 4 carbon atoms or (CxH2xO)m? wherein x is 2 to 4, m is 1 to 20, ? is hydrogen, an alkyl group containing 1 to 18 carbon atoms or an acyl group containing 1 to 4 carbon atoms provided m is greater than 1 when ? is hydrogen, while the other R3 is an alkvl, aryl or arylalkyl group containing 1 to 12 carbon atoms; R4 is an alkyl, aryl, or arylalkyl group containing 1 to 22 carbon atoms; X is halide; and Y is nitrogen, phosphorus, or sulfur are disclosed. The novel compounds are useful for inclusion in a detergent composition for imparting soil release benefits to metallic and vitreous surfaces washed or rinsed therewith.
268251
Heckert David C.
Watt David M. (jr.)
LandOfFree
Organosilane compounds does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Organosilane compounds, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Organosilane compounds will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-816627