Organosilicon compounds containing glycoside radicals and...

C - Chemistry – Metallurgy – 08 – G

Patent

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C08G 77/14 (2006.01) B01F 17/56 (2006.01) C07H 15/04 (2006.01) C07H 23/00 (2006.01) C08G 77/38 (2006.01)

Patent

CA 2114922

The present invention relates to a process for the preparation of an organosilicon compound containing glycoside radicals, which comprises, in a first stage reacting a monosaccharide and/or oligosaccharide (1) with a compound (2) of the formula HO-(R2O)c-R4 (IV) in which R2 are each independently an alkylene radical, c is 1 and R4 is an alkenyl radical, in the presence of an acid and in a second stage neutralizing the acid and reacting the glycoside containing compound obtained in the first stage with an organosilicon compound (3) containing Si-bonded hydrogen, containing units of the formula (see formula II) in which R5 are each independently a hydrocarbon radical having 1 to 18 carbon atoms, d is 0, 1, 2 or 3 and e is 0, 1, 2 or 3, in the presence of a hydrosilation catalyst, with the proviso that the sum of d + e is less than or equal to 3 and the organosilicon compound comprising unit of the formula (V) contains at least one Si-bonded hydrogen atom per molecule.

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