C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
C07F 7/10 (2006.01) C07F 7/08 (2006.01) C08F 230/08 (2006.01) C08G 77/26 (2006.01) C08G 77/388 (2006.01) C08G 77/398 (2006.01) C08G 77/42 (2006.01)
Patent
CA 2128342
The organosilicon compounds have at least one Si-C-bonded organic radical which contains at least one triazene group. The organosilicon compounds can be employed as heat- and light-unstable free radical initiators for the preparation of homo-, graft co- and block copolymers from olefinically unsaturated compounds and for crosslinking organosilicon compounds and organic compounds which can be polymerized by free radical polymerization.
Composés organosiliciés possédant au moins un radical organique à liaison Si-C qui contient au moins un groupe triazène. Les composés organosiliciés peuvent être employés comme initiateurs de radicaux libres thermo- et photo-instables pour la préparation d'homopolymères, de copolymères greffés et de copolymères blocs à partir de composés oléfinement insaturés et pour la réticulation des composés organosiliciés et composés organiques qui peuvent être fabriqués par polymérisation radicalaire.
Dauth Jochen
Deubzer Bernward
Kollefrath Ralf
Mayer Elfriede
Nuyken Oskar
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Wacker-Chemie Gmbh
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