Organosilicon polymer composition and use thereof for...

C - Chemistry – Metallurgy – 08 – L

Patent

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96/153, 400/7227

C08L 83/07 (2006.01) C08K 5/07 (2006.01) G03F 7/004 (2006.01) G03F 7/075 (2006.01)

Patent

CA 1278635

ORGANOSILICON POLYMER COMPOSITION AND USE THEREOF FOR PHOTOLITHOGRAPHY ABSTRACT A composition containing a polysiloxane having a polymerizable ethylenically unsaturated group, and 2,2-dimethoxy-2-phenyl acetophenone as an ultraviolet light sensitizer; and use thereof in lithography.

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