C - Chemistry – Metallurgy – 08 – L
Patent
C - Chemistry, Metallurgy
08
L
400/1305, 260/21
C08L 5/00 (2006.01) C03C 25/40 (2006.01) C08B 3/14 (2006.01) C08B 11/04 (2006.01) C08B 31/02 (2006.01) C08B 31/08 (2006.01) C08B 37/00 (2006.01) C08F 251/00 (2006.01) D06M 15/01 (2006.01) D21H 17/24 (2006.01)
Patent
CA 2009687
The present invention provides a polysaccharide derivative having the structure: (see above formula) wherein SacchO- is a residue of a polysaccharide molecule; R is an organic group which is bonded to the polysaccharide by an ether or ester linkage and to the silicon by a carbon-silicon linkage; R1 is a C1-C6 alkyl or alkenyl group, or an aryl, aralkyl, or alkaryl group; and R2 and R3 are, independently, C1-C6 alkyl or alkenyl groups, or aryl, aralkyl or alkaryl groups, or alkoxides of C1-C6 alkyl or alkenyl groups, or aryl, aralkyl or alkaryl groups, or alkoxides wherein R2 and R3 together form a cyclic structure of at least five members. The alkyl and alkenyl chains may be straight or branched. Also provided is a polysaccharide graft polymer, having the structure: SacchO-(G)m-(M)n-1-M , (II) wherein SacchO is a polysaccharide residue, m is zero or one; G is the residue of a polymerizable, unsaturated monomer which is bonded to the polysaccharide by an ether or ester linkage; n is greater than one; and M is the residue of one or more polymerizable, unsaturated, monomer(s), at least one of which is a siloxane-containing monomer, which have been grafted to the polysaccharide by free radical polymerization. The polysaccharide derivatives and graft polymers of this invention are useful in glass forming size compositions and in paper making.
Ablestik Laboratories
Borden Ladner Gervais Llp
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