C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
260/440
C07F 7/08 (2006.01) C07F 7/21 (2006.01) C08G 77/38 (2006.01) C09K 19/40 (2006.01)
Patent
CA 2028286
The present invention relates to compounds of the formula Image (I), in which Y represents an organosilicon radical; R" represents a divalent radical which connects the radical Y to the benzene ring via a chain of at least three atoms; X represents a radical of the formula -COOH, -CN, -CHO, -NH2 or -OH, in which it is possible to block the hydroxyl group with a protecting group; Z represents the same or different substi- tuents in the 2-, 3-, 5- or 6-position to the radical X, preferably hydrogen or halogen atoms; and p represents a value of 0 to 4; and the use of these and related compounds in the preparation of compounds having liquid-crystalline properties.
Brader Leonhard
Haas Wolfgang
Haberle Norman
Kreuzer Franz-Heinrich
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Consortium Fur Elektrochemische Gmbh
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