Oxide film, laminate and methods for their production

Details Oxide film, laminate and methods for their production Oxide film, laminate and methods for their production

C - Chemistry, Metallurgy

23

C

C23C 14/08 (2006.01) B32B 15/04 (2006.01) C03C 17/22 (2006.01) C03C 17/245 (2006.01) C03C 17/34 (2006.01) C03C 17/36 (2006.01) C23C 14/00 (2006.01) C23C 14/06 (2006.01) C23C 28/00 (2006.01) G02F 1/1343 (2006.01)

Patent

CA 2202430

A method for forming an oxide film on a substrate by a sputtering process using a target comprising a metal as the main component, wherein sputtering is carried out in an atmosphere which contains a gas containing carbon atoms.

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