Oxide thin film having quartz crystal structure and process...

Details Oxide thin film having quartz crystal structure and process... Oxide thin film having quartz crystal structure and process...

C - Chemistry, Metallurgy

30

B

C30B 29/18 (2006.01) C23C 14/10 (2006.01) C23C 16/40 (2006.01) C23C 18/12 (2006.01) C30B 5/00 (2006.01) C30B 23/02 (2006.01) C30B 25/02 (2006.01)

Patent

CA 2153848

An oxide thin film having a quartz crystal structure formed on a substrate, the oxide thin film being composed of a single layer or a plurality of layers having a thickness of 5 nm to 50 µm per layer, each of the layer comprising silicon dioxide, germanium dioxide, or a mixture thereof.

Affiliated with

Also associated with

Rating

Oxide thin film having quartz crystal structure and process... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Oxide thin film having quartz crystal structure and process..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Oxide thin film having quartz crystal structure and process... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-2090575