Oxime ester photoinitiators

C - Chemistry – Metallurgy – 07 – C

Patent

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Details

C07C 251/66 (2006.01) A61K 6/083 (2006.01) C07C 251/68 (2006.01) C07C 317/32 (2006.01) C07C 323/47 (2006.01) C07C 327/30 (2006.01) C07D 207/335 (2006.01) C07D 209/86 (2006.01) C07D 333/20 (2006.01) C07D 333/22 (2006.01) C07D 335/16 (2006.01) C07D 339/08 (2006.01) C08F 2/46 (2006.01) C09D 5/44 (2006.01) C09D 5/46 (2006.01) C09D 11/02 (2006.01) G03F 7/00 (2006.01) G03F 7/004 (2006.01) G03F 7/031 (2006.01) B41M 3/00 (2006.01)

Patent

CA 2328376

Compounds of the formulae I, II, III, IV and V (see formulas I, II, III, IV and V) wherein R1 is is C4-C9cycloalkanoyl, C1-C12alkanoyl, C4-C6alkenoyl, or benzoyl; R2 is for example phenyl, C1-C20alkyl, C3-C8cycloalkyl, C2-C20alkanoyl, or benzoyl; Ar1 is R4S- phenyl or NR5R6- phenyl, each of which optionally is substituted; or Ar1 is is (see formula VI) optionally substituted; or Ar1 is naphthyl or anthracyl each of which is unsubstituted or substituted; or Ar1 is benzoyl, naphthalenecarbonyl, phenanthrenecarbonyl, anthracenecarbonyl or pyrene- carbonyl, each of which is unsubstituted or substituted, or Ar1 is 3,4,5- trimethoxyphenyl, phenoxyphenyl or biphenyl; Ar2 is is (see formula VII) optionally substituted, or naphthyl or anthracyl, each of which is unsubstituted or substituted, x is 2 or 3; M1 when x is 2, for ex- ample is phenylene, naphthalene, anthracylene, each of which optionally is substituted; M1, when x is 3, is a trivalent radical; M2 for example is (see formula VIII) M3 is for example C1- C12alkylene, cyclohexylene, or phenylene; n is 1-20; R3 is for example hydrogen or C1- C12alkyl; R3' is is C1-C12alkyl; substituted or -O-interrupted C2-C6alkyl; R4 is for example hydrogen, or C1-C12alkyl; and R5 and R6 independently of each other is are hydrogen, C1- C12alkyl, or phenyl; are suitable as photoinitiators in particular in resist applications.

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