C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
96/150, 402/322,
C08F 28/00 (2006.01) C07C 309/63 (2006.01) C07C 309/73 (2006.01) C07C 309/75 (2006.01) C07C 309/76 (2006.01) C07C 309/77 (2006.01) C07D 333/24 (2006.01) C08F 20/38 (2006.01) G03F 7/039 (2006.01)
Patent
CA 1257868
Oxime sulfonates containing reactive groups Abstract of the Disclosure Oxime sulfonates of formula I Image (I) wherein Y is a polymerisable unsaturated group or epoxide group or an -OH, -NHR5, -COOH, -COOR4, -COCl, -CH2Hal, -SO2Cl or -NCO group, Z is an (x+y)-valent connecting member, R1 and R2 are monovalent organic radicals, m is 0 or 1, x is 1 or 2 and y is 1 or 2, can be converted into polymers which can be thermally or photochemically dissociated to form free sulfonic acid groups. Said polymers can therefore be used as photoresists which can be developed with aqueous alkalis.
506344
Berner Godwin
Demmer Christopher G.
Dietliker Kurt
Hunziker Max
Rutsch Werner
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
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