C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
400/2018, 134/3.
C08G 73/04 (2006.01) C08G 65/26 (2006.01) C08G 73/02 (2006.01) C11D 3/37 (2006.01)
Patent
CA 2030571
ABSTRACT OF THE DISCLOSURE Copolymers useful as surfactants and having polyoxyalkylene and poly(N-acylalkylenimine) blocks are disclosed. In a preferred embodiment, the copolymer contains polyoxypropylene and poly(N-acetylethylenimine) blocks. The block copolymers can be prepared by reacting a sulfonate ester terminated polyalkylene glycol with a 2-oxazoline or 1,3-oxazine monomer.
Aoi Keigo
Chujo Yoshiki
Miyamoto Masatoshi
Saegusa Takeo
Yamanaka Hidenori
Aoi Keigo
Arco Chemical Technology Inc.
Chujo Yoshiki
Miyamoto Masatoshi
Osler Hoskin & Harcourt Llp
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