Oxyfluoride in the form of a film and preparation method

C - Chemistry – Metallurgy – 01 – F

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Details

C01F 5/28 (2006.01) C01B 9/08 (2006.01) C04B 35/553 (2006.01) G02B 1/11 (2006.01)

Patent

CA 2629817

The invention relates to a porous nanostructured oxyfluoride film deposited on a substrate, a method for producing the same, and various applications. The oxyfluoride has a porous semi-crystalline structure and a refraction index of between 1.08 and 1.25, measured in the visible range for a relative humidity rate lower than 80 %. The chemical composition thereof corresponds to the formula (Mg(1-x) Cax)(1-y) My F(2+(n-2)y-2z-t)Oz(OH)tM'w wherein n is the valency of M, n being between 1 and 4, M represents at least one element selected from Al, Si, Ge, and Ga, M' represents at least one element selected from the group consisting of Co, Cr Ni, Fe, Cu, Sb, Ag, Pd, Cd, Au, Sn, Pb, Ce, Nd, Pr, Eu, Yb, Tb, Dy, Er and Gd, and 0 <= w < 0.1; 0 <= x <= 1; 0 <= y <= 0.5; z < 1, z+t > 0 and t < 2.

L'invention concerne un film d'oxyfluorure poreux nanostructuré déposé sur un substrat, un procédé pour son élaboration, ainsi que diverses applications. L'oxyfluorure a une structure semi-cristalline poreuse et un indice de réfraction de 1,08 à 1,25, mesuré dans le visible pour un taux d'humidité relative inférieur à 80%. Sa composition chimique correspond à la formule (Mg(1-x) Cax)(1-y) My F(2+(n-2)y-2z-t)Oz(OH)tM'w dans laquelle n est la valence de M, n étant de 1 à 4, M représente au moins un élément choisi parmi Al, Si, Ge, et Ga, M' représente au moins un élément choisi dans le groupe constitué par Co, Cr Ni, Fe, Cu, Sb, Ag, Pd, Cd, Au, Sn, Pb, Ce, Nd, Pr, Eu, Yb, Tb, Dy, Er et Gd, et 0 w < 0,1; 0 x 1; 0 y 0,5; z < 1, z+t > 0 et t < 2.

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