Oxyfluorination

Details Oxyfluorination Oxyfluorination

C - Chemistry, Metallurgy

08

J

C08J 7/06 (2006.01) C08J 7/12 (2006.01)

Patent

CA 2503412

The invention provides a process for the activation by oxyfluorination of at least part of a surface of a solid, which process includes exposing, under selected conditions of temperature and pressure and for a selected reaction time, at least part of the surface of the material of the solid to an oxfluorinating atmosphere. The oxyfluorinating atmosphere is a gas/ vapour mixture which includes at least one fluorine-containing gas which reacts with the material of the exposed surface, at least one oxygen-containing gas which reacts with the material of the exposed surface, and water vapour. The gases in the oxyfluorinatingatmosphere act to oxyfluorinate the exposed surface, thereby to activate it, and the water vapour acts to enhance the activation.

L'invention concerne un procédé d'activation, par oxyfluoruration d'au moins une partie d'une surface d'un solide, procédé consistant à exposer, dans des conditions choisies de température et de pression, et pendant un temps de réaction choisi, au moins une partie de la surface du matériau du solide, à une atmosphère d'oxyfluoruration. L'atmosphère d'oxyfluoruration est un mélange gaz/vapeur comprenant au moins un gaz contenant du fluor, réagissant avec le matériau de la surface exposée, au moins un gaz contenant de l'oxygène, réagissant avec le matériau de la surface exposée, et de la vapeur d'eau. Les gaz dans l'atmosphère d'oxyfluoruration agissent de manière à oxyfluorer la surface exposée, ce qui provoque son activation, la vapeur d'eau agissant pour améliorer l'activation.

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