Paper machine substrates resistant to contamination by...

D - Textiles – Paper – 21 – F

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D21F 1/10 (2006.01) D21F 1/30 (2006.01)

Patent

CA 2352838

A paper machine substrate modified to resist contamination by adhesive materials. The paper machine substrate includes: a paper machine substrate; and an active agent that is grafted to the surface of the paper machine substrate to lower the surface energy of the paper machine substrate so that the substrate resists contamination by adhesive material. The paper machine substrate may be made by a process that includes the steps of; providing a paper machine substrate; applying an active agent to the paper machine substrate; and exposing the paper machine substrate to greater than about 2 million rads (Mrad) of radiation to cause a reaction between the active agent and the substrate so the active agent becomes joined to the substrate. The active agent may be a fluorinated monomer, a fluorinated polymer, a perfluorinated polymer, or a polyalkyl siloxane.

La présente invention concerne un substrat de machine à papier modifié de façon qu'il résiste à une contamination induite par des matières adhésives. Ce substrat de machine à papier comprend: un substrat de machine à papier, et un agent actif greffé à la surface du substrat de la machine à papier de façon à réduire l'énergie de surface du substrat de la machine à papier afin que ce substrat résiste à la contamination induite par uneatière adhésive. Le substrat de machine à papier peut être réalisé selon un processus qui consiste à prendre un substrat de machine à papier, appliquer un agent actif sur ce dernier, exposer ledit substrat à un rayonnement supérieur à environ 2 millions de rad (Mrd) de façon à entraîner une réaction entre l'agent actif et le substrat, permettant ainsi de joindre l'agent actif audit substrat. L'agent actif peut être un monomère fluoré, un polymère fluoré, un polymère perfluoré, ou un polyalkyle siloxane.

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