G - Physics – 02 – B
Patent
G - Physics
02
B
345/26, 345/50,
G02B 3/00 (2006.01) B29D 11/00 (2006.01) H01L 21/306 (2006.01)
Patent
CA 2034671
Partially recessed microlenses are made in a substrate by a technique including the steps of forming a hard-baked patterned layer on a surface of the substrate, this patterned layer having at least one island portion surrounded by an auxiliary portion, and simultaneously etching this hard-baked patterned layer and the substrate to remove at least a portion of the thickness of the hard-baked layer. The island portions are located at areas overlying where microlenses are desired. The volume of the auxiliary portions of the hard-baked patterned layer is advantageously significantly greater than that of the island portions. Fully recessed microlenses are made by adding a step in the above technique, namely, the step of forming another hard-baked patterned layer covering only the auxiliary portions of the above-mentioned patterned layer prior to the etching.
American Telephone And Telegraph Company
Kirby Eades Gale Baker
LandOfFree
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