Particle-free cathodic arc carbon ion source

C - Chemistry – Metallurgy – 23 – C

Patent

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Details

C23C 14/22 (2006.01) C23C 14/06 (2006.01) C23C 14/32 (2006.01) H01J 37/32 (2006.01)

Patent

CA 2256847

A method and apparatus for vacuum arc deposition of carbon on a substrate inhibits or eliminates emission of contaminating carbon particles in the ion plasma by maintaining an elevated local plasma pressure at the cathode or target surface, thereby minimizing the role of heat conduction in the creation of the particles and strongly increasing the electron emission cooling effects.

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