Pattern forming apparatus

Details Pattern forming apparatus Pattern forming apparatus

G - Physics

03

F

356/177

G03F 7/20 (2006.01)

Patent

CA 1159160

ABSTRACT OF THE DISCLOSURE There is disclosed a pattern forming apparatus for projecting a pattern which is formed on a reticle upon a photoresist layer on a substrate which comprises an illumination system for illuminating the pattern for forming an optical image, a reduction lenses for reducing the optical pattern image at a certain reduction ratio and projecting the reduced optical pattern image upon the photoresist layer formed on the substrate for exposing the photoresist layer, and liquid sustaining means for filling a gap between at least a portion of the reduction lenses and the photoresist layer with an optically transparent liquid having a refractive index of more than 1 (one).

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