Pattern generating apparatus

Details Pattern generating apparatus Pattern generating apparatus

H - Electricity

01

L

356/192, 74/56,

H01L 21/70 (2006.01) B23K 26/08 (2006.01) G01D 15/24 (2006.01) G03F 7/20 (2006.01) H01B 3/00 (2006.01)

Patent

CA 1048661

PATTERN GENERATING APPARATUS Abstract of the Disclosure Integrated circuit mask patterns are laser machined by mounting substrates on a support that is periodically stepped in a y direction after each scan by a laser writing beam in an x direction. X-direction scanning is accomplished by mounting a mirror on a carriage that reciprocates by rebounding between two displaced coil springs. A coding laser beam is reflected from the carriage through a stationary code plate, comprising alternate transparent and opaque stripes, to monitor the position of the carriage and to control the modulation of the writing beam.

232908

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