Pattern recognition system and method

Details Pattern recognition system and method Pattern recognition system and method

H - Electricity

01

L

341/105, 356/194

H01L 21/68 (2006.01) G03F 9/00 (2006.01) G06K 9/32 (2006.01)

Patent

CA 1164551

Abstract of the Invention A pattern recognition system for providing automatic align- ment capability for a semiconductor wafer 10 or other ob- ject. The system includes an integrator 32 for electronic- ally smearing input data representing the reflected light level of a scanned object 10, means 35-37 for digitizing the smeared data, and processor means 60 for determining the best match between the smeared, digitized data and pre- determined stored data, thereby representing proper align- ment of the wafer 10 or other object.

377837

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