Pattern tracer with variable effective forward offset and...

G - Physics – 06 – K

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G06K 11/02 (2006.01) B23Q 35/128 (2006.01)

Patent

CA 1236195

ABSTRACT OF THE DISCLOSURE A pattern tracer and method of tracing in which the movement of a tracing element along a pattern is controlled in accordance with an effective forward offset which is selectively less than the actual forward offset to optimize the tracing for speeds less than the maximum tracer speed. The effective forward offset is established by providing control angles which are based on the pattern angles as detected in accordance with a selected criterion depending upon the type of pattern curve detected. The control angles are either calculated from the detected pattern angles or are selected from previously stored pattern angles. A kerf setting for lateral offset of the tracing element from the pattern is partially defined by the actual forward offset, so that changes in the effec- tive forward offset do not cause any corresponding changes to the lateral offset or require changes to the kerf setting.

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