C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/111
C07D 519/00 (2006.01) C07D 499/00 (2006.01)
Patent
CA 1240667
ABSTRACT OF THE DISCLOSURE This invention provides a penam derivative represented by the formula (I) Image wherein R is hydrogen or methyl and R1 is (hexahydro-1H-azepon-1- yl)methyleneamino, 2-phenylacetamido, 2-phenoxyacetamido, 2- amino-2-phenylacetamido, 2-amino-2-(p-hydroxyphenyl)acetamido or 2-(4-ethyl-2,3-dioxo-1-piperazine)carboxamido-2-phenylacetamido, and a pharmaceutically acceptable salt thereof, and processes for preparing them.
478067
Kajitani Makoto
Tanaka Motoaki
Yamazaki Tomio
Marks & Clerk
Taiho Pharmaceutical Co. Ltd.
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