C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/238.8
C07D 498/22 (2006.01)
Patent
CA 1078376
ABSTRACT OF THE DISCLOSURE A pentacyclic derivative of the general formula: Image I in which: R represents a hydrogen atom or a hydroxyethyl radical, R1 represents a hydrogen atom, R and R1 being in the trans position in relation to one another, or alternatively together forming a double bond, and R2 and R3, which may be the same or different, represent a hydrogen atom or a halogen atom or an alkyl radical containing 1 to 4 carbon atoms or alkyloxyl radical whose alkyl part contains 1 to 4 carbon atoms, or else R2 and R3 together form a dioxy- methylene radical, its optically active forms, its addition salts with acids, its quaternary ammonium salts and its N-oxides and the process for preparing said derivative.
255310
Besselievre Richard
Husson Henri P.
Potier Pierre
Thal Claude
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