C - Chemistry – Metallurgy – 07 – K
Patent
C - Chemistry, Metallurgy
07
K
C07K 5/06 (2006.01) A61K 31/27 (2006.01) A61K 31/395 (2006.01) A61K 38/05 (2006.01) C07C 235/34 (2006.01) C07C 237/22 (2006.01) C07C 237/42 (2006.01) C07C 271/08 (2006.01) C07C 271/22 (2006.01) C07C 271/24 (2006.01) C07C 271/28 (2006.01) C07C 271/30 (2006.01) C07C 311/47 (2006.01) C07D 207/10 (2006.01) C07D 207/16 (2006.01) C07D 209/42 (2006.01) C07D 211/60 (2006.01) C07D 211/78 (2006.01) C07D 277/56 (2006.01) C07D 471/04 (2006.01) C07K 5/02 (2006.01) A61K 38/00 (2006.01)
Patent
CA 2117121
- 41 - Abstract Compounds o formula R-A1-A2-X-A3 wherein R i H, a protecting group or optionally substituted benzyloxy, A1 is an .alpha.-hdroxy or .alpha.-amino acid residue or a radical (.alpha.) as defined hereinafter, A2 is an .alpha.-hydroxy or .alpha.-amino acid residue or A1 and A2 form together a pseudo-dipeptide or a dipeptide mimetics residue or a radical (aa), (bb) or (cc) as defined hereinafter, X is a residue derived from Asp and A3 is -CH2-X1-CO-Y1, -CH2-O-Y2, -CH2-S-Y3 or -CH2-(CO)m-Y6 wherein X1 is O or S, m is 0 or 1 and Y1, Y2, Y3 and Y6 are as defined herein after, have pharmacological activity, e.g. IL-1.beta. release inhibiting properties.
Heng Richard
Leutwiler Albert
Revesz Laszlo
Wuthrich Hans-Jurg
Heng Richard
Kirby Eades Gale Baker
Leutwiler Albert
Revesz Laszlo
Wuthrich Hans-Jurg
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