C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 17/08 (2006.01) C11D 9/02 (2006.01) C11D 9/24 (2006.01) C11D 9/26 (2006.01) C11D 9/48 (2006.01) C11D 10/04 (2006.01) C11D 17/00 (2006.01) A61K 7/50 (1995.01)
Patent
CA 2139750
A very stable mild soap personal cleansing and moisturizing composition comprising: C8-C22 free fatty acid soap, C8-C22 free fatty acid, water, and petrolatum, preferably having a weight average particle size larger than 45 microns.
Divulgation d'une composition nettoyante et hydratante d'un savon doux très stable pour l'hygiène personnelle comprenant : un savon d'acide gras libre en C8-C22, un acide gras libre en C8-C22, de l'eau et de la vaseline dont la dimension moyenne des particules dépasse de préférence 45 microns.
Evans Marcus W.
Kacher Mark L.
Schwartz James R.
Taneri James E.
Torres Efrain
Gowling Lafleur Henderson Llp
The Procter & Gamble Company
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