Perturbation of the mask aperture spacing for improved mask...

Details Perturbation of the mask aperture spacing for improved mask... Perturbation of the mask aperture spacing for improved mask...

H - Electricity

01

J

313/35.16

H01J 29/81 (2006.01) H01J 29/07 (2006.01) H01J 31/00 (2006.01)

Patent

CA 1228110

Abstract An improvement is made in a color picture tube having a slit-type shadow mask mounted therein in spaced relation to a cathodoluminescent line screen. For the mask, the spacing between adjacent aperture columns increases from center-to-edge as approximately the fourth power of the distance from the center. Such fourth order spacing variation permits shaping of the shadow mask so that the contour of the mask along its major axis also varies as a function substantially of the fourth power of distance from the center of the mask.

482083

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