C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 455/03 (2006.01) A61K 31/47 (2006.01) C07D 471/04 (2006.01)
Patent
CA 2329434
The novel compounds of chemical formulae (I) and (II) exhibit in vitro antifungal activity against fungi including cutaneous filamentous fungus, such as Epidermophyton, Microsporum, Trichophyton, Sporothrix schenckii, Aspergillus or Candida. The compounds of the present invention exhibit in vitro antifungal activity at the concentration of 1-100 µg/ml, in formulae (I) and (II) R1, R2, and R4 may be the same or different, and represent C1-C5 alkoxy, R3 represents hydrogen or C1-C10 alkyl, A- represents inorganic acid ion, organic acid ion or halide, R5 represents hydrogen, pyridylmethyl, substituted pyridylmethyl or a group having chemical formula (XI), wherein Z1, Z2, Z3, Z4 and Z5 may be the same or different, and independently of one another represent hydrogen, halogen, C1-C5 alkyl, trifluoromethyl, phenyl, substituted phenyl, nitro, C1-C4 alkoxy, trifluoromethoxy, hydroxy, phenoxy, vinyl, methoxycarboxyl groups.
Les nouveaux composés correspondant aux formules chimiques (I) et (II) montrent in vitro une activité antifongique contre les fungidés, y compris le champignon filamenteux cutané tel que Epidermophyton, Microsporum, Tricophyton, Sporothrixschencskii, Aspergillus ou Candida. Les composés en question montrent in vitro une activité antifongique à une concentration de 1-100 µg/ml, où R?1¿, R?2¿ et R?4¿ peuvent identiques ou différents, et représentent C¿1?-C¿5? alkoxy, R?3¿ représente hydrogène ou C¿1?-C¿10? alkyl, A?-¿ représente un ion acide inorganique, un ion acide organique ou un halogénure, R?5¿ représente hydrogène, pyridyméthyle, pyridyméthyle substitué ou un groupe correspondant à la formule suivante (XI), où Z?1¿, Z?2¿, Z?3¿, Z?4¿ et Z?5¿ peuvent identiques ou différents et, indépendamment les uns des autres, représentent des groupes hydrogène, halogène, C¿1?-C¿5? alkyle, trifluorométhyle, phényle, phényle substitué, nitro, C¿1?-C¿4? alkoxy, trifluorométhoxy, hydroxy, phénoxy, vinyl et méthoxycarboxyle.
Jhong Tae Neung
Kim Eui Deok
Kim Jung Ho
Kim Seung Un
Lee You Suk
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Hanwha Chemical Corporation
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