C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/602, 260/353
C07D 317/58 (2006.01) C07D 317/64 (2006.01)
Patent
CA 1178597
ABSTRACT OF THE DISCLOSURE Processes are provided for the preparation of novel cyclopropane derivatives of the formula Image wherein Ar is phenyl or phenyl monosubstituted or polysubstituted by F, C1, Br, C14 alkyl, C1-4 alkoxy, C2-4 alkenyloxy, C1-4 alkylthio, ON, SH, CN, methylenedioxy or CF3; and R is H, C1-4 alkyl or benzyl, or a physio- logically acceptable acid addition salt thereof. Such novel cyclopropan- derivatives have valuable pharmacological properties, e.g., as antidepres- sants.
377048
Hausberg Hans-Heinrich
Minck Klaus-Otto
Seyfried Christoph
Uhl Juergen
Borden Ladner Gervais Llp
Merck Patent Gesellschaft Mit Beschraenkter Haftung
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