C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/466.05
C07D 233/96 (2006.01) C07C 335/32 (2006.01)
Patent
CA 1083171
ABSTRACT OF THE DISCLOSURE Compounds of the formula: Image wherein n is an integer from 3 to 6, R is lower alkyl or Image , X is sulphur, NCN or CHNO2 are disclosed. The compounds are useful as histamine H2-antagonists and act, for example, as inhibitors of gastric acid secretion and anti-inflammatory agents.
266796
Durant Graham J.
Ganellin Charon R.
Ife Robert J.
Gowling Lafleur Henderson Llp
Smith Kline & French Laboratories Limited
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