C - Chemistry – Metallurgy – 07 – K
Patent
C - Chemistry, Metallurgy
07
K
530/7.06, 530/5.
C07K 14/70 (2006.01)
Patent
CA 1140539
X-5104 Abstract of the Disclosure Compounds of the formula Image (I) and pharmaceutically acceptable non-toxic acid addition salts thereof, in which L and D define the chirality; R1 is hydrogen or C1-C3 primary alkyl; R2 is C1-C4 primary or secondary alkyl, allyl, cyclopropylmethyl, C1-C2 hydroxyalkyl, or -(CH2)m-U-CH3 in which U is -S- or Image and m is 1 or 2; R3 is hydrogen, C1-C4 primary or secondary alkyl, cyclopropylmethyl, or allyl; X is hydrogen, halo, hydroxy, C1-C3 alkoxy, nitro, C1l-C3 alkyl, or trifluoromethyl; and Z is -CH2OR4, -?-NHR4, or -?-OR5, in which R4 is hydrogen or C1-C3 alkyl and R5 is C1-C3 alkyl; are useful analgesic agents. These compounds of formula I are prepared by deblockiny the corresponding blocked compound of formula I by conventional methods.
366540
Gesellchen Paul D.
Smiley David L.
Eli Lilly And Company
Gowling Lafleur Henderson Llp
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