Phase mask with spatially variable diffraction efficiency

Details Phase mask with spatially variable diffraction efficiency Phase mask with spatially variable diffraction efficiency

G - Physics

03

F

G03F 1/00 (2012.01) G02B 6/124 (2006.01)

Patent

CA 2281787

A phase mask (15) for modulating a collimated light beam passing therethrough, the light beam being diffracted to photoinduce a refractive index profile in a photosensitive optical medium, the phase mask (15) comprises a substrate (17) having an outer surface provided with a plurality of parallel grating corrugations (19). The grating corrugations (19) have a non-uniform relief depth across the outer surface for photoinducing a non-uniform refractive index profile in the photosensitive optical medium. The non-uniform relief depth is defined by a variable thin film layer (21) of variable thickness overlaying the substrate (17). The grating corrugations (19) can either be etched into the variable thin film layer (21) itself or be etched into the substrate (17), with the variable thin film layer (21) being deposited on it after etching. Methods to make such phase masks are also provided.

Masque de phase (15) servant à moduler un faisceau lumineux collimaté qui le traverse et qui est diffracté afin de photo-induire un profil d'indice de réfraction dans un milieu optique photosensible, et comprenant un substrat (17) possédant une surface extérieure pourvue d'une pluralité de cannelures (19) de réseau de diffraction. Ces cannelures (19) présentent une profondeur non uniforme de relief à travers la surface extérieure, de manière à photo-induire un profil d'indice de réfraction non uniforme dans le milieu optique photosensible. La profondeur non uniforme de relief est définie par une couche mince variable (21) d'épaisseur variable recouvrant le substrat (17). Les cannelures (19) du réseau de diffraction peuvent être gravées par attaque chimique soit dans la couche mince (21) elle-même, soit dans le substrat (17), la couche mince variable (21) étant déposé sur le substrat après gravure. L'invention concerne également des procédés servant à fabriquer ces masques de phase.

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