Phenol-free and chlorinated hydrocarbon-free photoresist...

Details Phenol-free and chlorinated hydrocarbon-free photoresist... Phenol-free and chlorinated hydrocarbon-free photoresist...

C - Chemistry, Metallurgy

11

D

149/26, 149/8

C11D 3/43 (2006.01) B08B 3/08 (2006.01) C11D 1/22 (2006.01) C11D 3/34 (2006.01) C23G 5/02 (2006.01)

Patent

CA 1116059

ABSTRACT PHENOL-FREE AND CHLORINATED HYDROCARBON-FREE PHOTORESIST STRIPPER Stripping solutions, free from phenol and chlor- inated hydrocarbon compounds, comprising a surfactant alkylarylsulfonic acid having 12-20 carbons, a hydrotropic aromatic sulfonic acid having 6-9 carbons and a halogen- free aromatic hydrocarbon solvent with a boiling point above 150°C. The stripping compositions effectively remove organic polymeric substances from inorganic substrates and are substantially clear water rinsable.

326518

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