Phenol-free photoresist stripper

Details Phenol-free photoresist stripper Phenol-free photoresist stripper

G - Physics

03

C

149/26, 149/12.1

G03C 11/12 (2006.01) G03F 7/42 (2006.01)

Patent

CA 1074219

ABSTRACT OF THE DISCLOSURE Stripping solutions, free from phenol compounds, comprising at least 30 weight percent of an unsubstituted or alkyl substituted aryl sulfonic acid have been found effective for removal of organic polymeric substances from inorganic substrates. The novel compositions comprise 30 - 80 percent of the sulfonic acid in admixture with perchloroethylene, dichlorobenzene, dodecylbenzene or an isoparaffinic hydrocarbon.

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