Phenol-free photoresist stripper

Details Phenol-free photoresist stripper Phenol-free photoresist stripper

C - Chemistry, Metallurgy

11

D

149/26, 96/69

C11D 7/50 (2006.01) C11D 1/22 (2006.01) C11D 3/34 (2006.01) C11D 3/43 (2006.01) G03F 7/42 (2006.01)

Patent

CA 1074220

ABSTRACT OF THE DISCLOSURE Stripping solutions, free from phenol compounds, com- prising at least 30 weight percent of an unsubstituted or alkyl substituted aryl sulfonic acid have been found effective for removal of organic polymeric substances from inorganic substrates. The novel compositions comprise 30-80 percent of one or more of the sulfonic acids in admixture with chlorinated aryl compounds, alkylaryl compounds having 1-14 alkyl carbons, an isoparaffinic hydrocarbon, or mixtures thereof.

289237

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